Structure tampon entre du carbure du silicium et du nitrure de gallium et dispositifs semi-conducteurs ainsi obtenus

Buffer structure between silicon carbide and gallium nitride and resulting semiconductor devices

Abstract

A transition crystal structure is disclosed for providing a good lattice and thermal match between a layer of single crystal silicon carbide (25) and a layer of single crystal gallium nitride (24). The transition structure comprises a buffer formed of a first layer of gallium nitride and aluminum nitride (22). and a second layer of gallium nitride and aluminum nitride (23) adjacent to the first layer. The mole percentage of aluminum nitride in the second layer (23) is substantially different from the mole percentage of aluminum nitride in the first layer (22). A layer of single crystal gallium nitride (24) is formed upon the second layer of gallium nitride and aluminum nitride. In preferred embodiments the buffer further comprises an epitaxial layer of aluminum nitride upon a silicon carbide substrate.

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